Wafer Reclaim, Wafer, 웨이퍼, Removing of depositions on wafer
▲ECOS-F6 Chemical Surface Treatment ▲Water Rinsing ▲Water Rinsing 후 Si Wafer ***Test Chemical: ECOS-F6, Temp: about 50 ℃, Dipping Time: about 2 minute*** 홈페이지: https://www.skpchem.com 유튜브: SkpChem - YouTube